Professor Room: Phys. Dep 303
E-mail: daizhl@
Fax: 0411-84709304
Zhong-Ling Dai associate professor
Education
Sep. 2000---Jul. 2004, Dalian University of Technology, Doctor’s degree
Sep. 1986---Jul. 1989, Jilin University, Master’s degree
Sep. 1982---Jul. 1986, Dalian University of Technology, Bachelor’s degree
Work Experience
As a responsible person, I have completed a project supported by National Natural Science Foundation Of China. I am taking part in many research works supported by National Natural Science Foundation Of China and Grant for Striding-Century Excellent Scholar of Ministry of Education State of China.
Research Interests
Theory and modeling of low temperature plasma discharges Characteristics of plasma sheath Mechanism of plasma etching
Publications
1.Z. L. Dai，X Xu and Y. N. Wang, A self-consistent hybrid model of dual frequency sheath: ion energy and angular distributions, PHYSICS OF PLASMAS. 14, 013547 (2007).
2. Xiang Xu, Shuai Wang, Zhongling Dai, Younian Wang， Influence of the low-frequency source parameters on the plasma characteristics in a dual frequency capacitively coupled plasma reactor: Two dimensional simulations， Progress in Natural Science，10-MAR-2009
3. Zhen-Hua Bi, Zhong-Ling Dai, Xiang Xu, Zhi-Cheng Li, and You-Nian Wang， Numerical results for the Ar and CF4 mixture gas in dual frequency capacitively coupled plasma using a hybrid model， Physics of Plasmas （2009）
4. Dai Zhong-Ling, Liu Chuan-Sheng, Wang You-Nian, Two-dimensional Simulation of a Dual Frequency Sheath near an Electrode with a Cylindrical Hole, PLASMA SCIENCE & TECHNOLOGY, （2009）
5. Jiang, Wei, Xu, Xiang, Dai, Zhong-Ling , Wang, You-Nian, Heating mechanisms and particle flow balancing of capacitively coupled plasmas driven by combined dc/rf sources, Physics of Plasmas, 15(3), 033502-1, (2008).
6. Liu, Yu , Dai, Zhong-Ling, Wang, You-Nian, Dust particle properties in a dual-frequency driven sheath, CHIN.PHYS.LETT., 25(4), 1372 ( 2008).
7.Mao M , Wang S , Dai Z L and Wang Y N, RF electric field penetration and power deposition into nonequilibrium planar-type inductively coupled plasmas, CHINESE PHYSICS 16,2044 ( 2007)
8. Mao M , Dai Z L and Wang Y N, Two-dimensional self-consistent kinetic model for solenoidal inductively coupled plasma , PLASMA SCIENCE & TECHNOLOGY 9 (1): 30-34 FEB 2007.
9.Z. L. Dai, C. S. Liu and Y. N. Wang, Comparison between Dual Radio Frequency- and Pulse-Driven Sheath near Insulating Substrates, CHIN.PHYS.LETT. 25, 632 (2008) .
10. Zhen-Qun Guan, Zhong-Ling Dai , and You-Nian Wang, Simulations of dual rf-biased sheaths and ion energy distributions arriving at a dual rf-biased electrode, PHYSICS OF PLASMAS 12, 123502 (2005).
11. WANG Li-Hong , DAI Zhong-Ling , and WANG You-Nian, Investigation of dual radio-frequency driven sheaths and ion energy distributions bombarding an insulating substrate, CHIN.PHYS.LETT. 23, 668 (2006).
12. DAI Zhong-ling, WANG You-nian, Characteristics of single and dual radio-frequency (RF) plasma sheaths, Front. Phys. China 2, 178−185 (2006).
13. 戴忠玲, 毛明, 王友年. 等离子体刻蚀工艺的物理基础. 物理. 35, 693（2006）.
14.Z. L. Dai and Y. N. Wang, Simulations of ion transport in a collisional radio-frequency plasma sheath, Phys. Rev. E 69, 036403 (2004). 15.Z. L. Dai , Y. N. Wang and T. C. Ma, Spatio-temporal characteristics of the collisionless rf sheath and the ion energy distributions arriving at rf-biased electrodes, Phys. Rev. E 65, 036403 (2002).
16. Z. L. Dai and Y. N. Wang, Multiple ion dynamics model for the collisionless rf sheaths and the ion energy distributions at rf-biased electrodes in fluorocarbon plasmas, Phys. Rev. E 66, 026413 (2002).
17. Z. L. Dai and Y. N. Wang, Dynamic Sheath Model at Pulsed-Biased Insulating Substrates , J. Appl. Phys. 92, 6428 (2002).
18. Z. L. Dai and Y. N. Wang, Comparison between characteristics of radio-frequency sheaths and pulse sheaths with insulating substrates, Surf. Coat. Technol. 165, 224 (2003).
19. 戴忠玲,王友年,马腾才, 射频等离子体鞘层动力学模型, 物理学报 50 ,2398(2001).
